发明名称 Contact probe, mask and fabrication method thereof
摘要 A method is disclosed for producing a probe capable of keeping sure electric conduction between the probe and a conductive pad. The method comprises the steps of: applying photo resists 500 onto the front and rear faces of a conductive plate-form material 400 which is to make a probe 100; masking one face of the plate-form material 400 with a first mask 200, and masking the other face of the plate-form material 400 with a second mask 300; subjecting the photo resists 500 to exposure to light and development; and using the photo resists 500 remaining in the exposure and development the step as mask materials 510 to etch the plate-form material 400. <IMAGE>
申请公布号 EP1357385(A1) 申请公布日期 2003.10.29
申请号 EP20030252623 申请日期 2003.04.25
申请人 NIHON DENSHIZAIRYO KABUSHIKI KAISHA 发明人 MORI, CHIKAOMI
分类号 G01R1/067;G01R1/073;G01R3/00;G01R31/28;H01L21/66 主分类号 G01R1/067
代理机构 代理人
主权项
地址