发明名称 |
Contact probe, mask and fabrication method thereof |
摘要 |
A method is disclosed for producing a probe capable of keeping sure electric conduction between the probe and a conductive pad. The method comprises the steps of: applying photo resists 500 onto the front and rear faces of a conductive plate-form material 400 which is to make a probe 100; masking one face of the plate-form material 400 with a first mask 200, and masking the other face of the plate-form material 400 with a second mask 300; subjecting the photo resists 500 to exposure to light and development; and using the photo resists 500 remaining in the exposure and development the step as mask materials 510 to etch the plate-form material 400. <IMAGE> |
申请公布号 |
EP1357385(A1) |
申请公布日期 |
2003.10.29 |
申请号 |
EP20030252623 |
申请日期 |
2003.04.25 |
申请人 |
NIHON DENSHIZAIRYO KABUSHIKI KAISHA |
发明人 |
MORI, CHIKAOMI |
分类号 |
G01R1/067;G01R1/073;G01R3/00;G01R31/28;H01L21/66 |
主分类号 |
G01R1/067 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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