发明名称 Imageable element having a protective overlayer
摘要 Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive composition; and a protective overlayer, which has an overlayer material that reduces the solubility of the photosensitive composition in an aqueous alkaline developer. The overlayer may be conveniently applied by a dip and rinse procedure.
申请公布号 EP1241003(A3) 申请公布日期 2003.10.29
申请号 EP20020005304 申请日期 2002.03.12
申请人 KODAK POLYCHROME GRAPHICS COMPANY LTD. 发明人 SAVARIAR-HAUCK, CELIN;FRANK, DIETMAR;HAUCK, GERHARD;FIEBAG, ULRICH
分类号 B41C1/10;(IPC1-7):B41C1/10;G03F7/11 主分类号 B41C1/10
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