发明名称 |
Imageable element having a protective overlayer |
摘要 |
Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive composition; and a protective overlayer, which has an overlayer material that reduces the solubility of the photosensitive composition in an aqueous alkaline developer. The overlayer may be conveniently applied by a dip and rinse procedure. |
申请公布号 |
EP1241003(A3) |
申请公布日期 |
2003.10.29 |
申请号 |
EP20020005304 |
申请日期 |
2002.03.12 |
申请人 |
KODAK POLYCHROME GRAPHICS COMPANY LTD. |
发明人 |
SAVARIAR-HAUCK, CELIN;FRANK, DIETMAR;HAUCK, GERHARD;FIEBAG, ULRICH |
分类号 |
B41C1/10;(IPC1-7):B41C1/10;G03F7/11 |
主分类号 |
B41C1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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