发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A means of providing pitch torque compensation for planar motors in which pitch torque is not inherently provided. The pitch torques for a given set of forces ideally required to be applied by each forcer in the planar motor may be calculated and summed. Correction forces for each forcer are determined such that the net effect of the corrections is equal and opposite to the pitch torques previously determined. <IMAGE>
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申请公布号 |
EP1357429(A1) |
申请公布日期 |
2003.10.29 |
申请号 |
EP20020252853 |
申请日期 |
2002.04.23 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
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分类号 |
H01L21/027;G03F7/20;H02K41/03;(IPC1-7):G03F7/20;H02K41/035 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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