发明名称 Hole metal-filling method
摘要 A hole metal-filling method, applied to hole filling and electroplating a printed circuit board which has been mechanical-drilled with holes. A plurality of holes is drilled in a substrate. The substrate is placed on a platform. A plurality of metal balls is disposed on a surface of the substrate. By vibrating the platform, a part of the metal balls roll into the holes, while the metal balls not rolling into the holes are removed. The substrate is then placed on a press down unit. The metal balls in the holes are pressed to level with surfaces of the substrate. The substrate is directly electroplated for forming a plating layer closely dovetail to the metal balls.
申请公布号 US6638858(B2) 申请公布日期 2003.10.28
申请号 US20010020700 申请日期 2001.10.30
申请人 UNIMICRON TAIWAN CORP. 发明人 CHENG DAVID C. H.
分类号 H01L21/48;H05K3/40;(IPC1-7):H01L21/44 主分类号 H01L21/48
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