发明名称 LASER EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To obtain a laser exposure system in which the labor of a worker required for matching the scan start position and the dot pitch is lessened significantly. SOLUTION: The laser exposure system comprises a test exposing section 211 for forming R, G and B exposure lines corresponding to R, G and B laser beams on a photosensitive material 1 in parallel with the main scanning direction, a section 212 for acquiring various test exposure data, a first clock frequency calculating section 213 for setting the dot pitch of the R laser beam at 320 dpi based on the test exposure data thus acquired, a second clock frequency calculating section 214 for setting the dot pitch of the G and B laser beams at 320 dpi, and first and second sections 215 and 216 for matching the scan start positions of the R, G and B laser beams. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003305885(A) 申请公布日期 2003.10.28
申请号 JP20020111003 申请日期 2002.04.12
申请人 NORITSU KOKI CO LTD 发明人 OKI YOZO;KURISU HIDEYUKI
分类号 B41J2/44;H04N1/113;H04N1/23;(IPC1-7):B41J2/44 主分类号 B41J2/44
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