| 摘要 |
An e-beam deposition method and apparatus uses a metallic target and localized oxygen ambient to produce an oxide film for deposition. A metallic target is first heated, then exposed to a stream of oxide, resulting in the formation of a relatively thin layer of oxide on the metallic target surface. Since the oxide has a higher vapor pressure than the underlying metal, when the target is impinged by an electron-beam current, the oxide will preferentially vaporize and be deflected toward the surface to coated.
|
