| 摘要 |
FIB equipment, which irradiates a sample placed on a stage with a focused ion beam (FIB) to perform etching or deposition at the irradiation position, includes an alignment mark formation unit to form an alignment mark by irradiating a periphery of a processing position with the FIB; and a processing position detection unit to superpose an optical microscope image of the area of the processing position at which the alignment mark is formed, and a scanning ion microscope image (SIM image) acquired by FIB irradiation, based on the alignment mark image, and to detect the processing position on the superposed images.
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