| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for manufacturing a substrate for an electro- optical device which can yield a crystallized electroconductive layer at a low temperature. SOLUTION: The manufacturing process comprises steps wherein an amorphous seed film 90 is formed on a substrate 101 at a temperature lower than the heat-resisting temperature of the substrate 101, the amorphous seed film 90 is crystallized through a rapid thermal annealing process, and a main film is formed on the crystallized seed film 9a through a heat-treatment performed at a temperature lower than the heat-resisting temperature of the substrate 101. The process enables crystallization of the electroconductive layer without giving any damage such as deterioration, etc., to the substrate 101. COPYRIGHT: (C)2004,JPO
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