发明名称 PHOTOSENSITIVE PATTERN FORMING CURABLE RESIN COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL PANEL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a curable resin capable of freely regulating alkali solubility and curability, having high sensitivity and capable of achieving rapid curing with small light exposure even when only a small amount of a photoinitiator is used. <P>SOLUTION: A curable resin composition comprises an imido-containing copolymer (a) having a molecular structure formed by linking a constitutional unit having a cyclic imido group represented by formula (1), a constitutional unit having an acidic functional group such as a carboxyl group and a constitutional unit having an ethylenically unsaturated bond which undergoes a crosslinking reaction with the cyclic imido group, and a polyfunctional thiol compound (b). <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003302759(A) 申请公布日期 2003.10.24
申请号 JP20020108254 申请日期 2002.04.10
申请人 TOAGOSEI CO LTD;DAINIPPON PRINTING CO LTD 发明人 OKAZAKI EIICHI;MAEDA YOSHIHARU;HAYASHI SHINJI
分类号 G03F7/038;C08F290/12;G02B5/20;G02F1/1335;G03F7/004 主分类号 G03F7/038
代理机构 代理人
主权项
地址