SUBSTRATE FOR ELECTRO-OPTIC DEVICE, ELECTRO-OPTIC DEVICE, ELECTRONIC APPARATUS AND PROJECTION TYPE DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a configuration for achieving a uniform polishing rate without thickening of an interlayer insulation film to be polished in a liquid crystal panel substrate having a stacked film structure consisting of interlayer insulation films and metal layers alternately formed on a semiconductor substrate provided with a transistor region for pixel selection thereon.

SOLUTION: The liquid crystal panel substrate is provided with a connecting plug 15 connecting a wiring film 10 composed of a first metal layer and the pixel electrode composed of a third metal layer across a 2nd interlayer insulating film 11 under the shading film and a third interlayer insulating film 13 over the shading first metal layer through an opening 12a provided in the shading film 12. A lower dummy pattern A composed of the first metal layer and an upper dummy pattern B composed of the second metal layer are stacked one over the other on the periphery of input terminal pads 26 in a non-pixel region. Since the surface level of the third interlayer insulation film 13 formed on the dummy patterns A and B is raised, excessive polishing is prevented at the position. As a result, a uniform polishing rate is achieved in CMP treatment.

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