发明名称 METAL DIAPHRAGM VALVE
摘要 A metal diaphragm valve for use inter alia in semiconductor facilities. This metal diaphragm valve is so designed as to reduce the fluid resistance of the flui d path from the valve chamber to the outflow path of the body and allows a large quantity of fluid to flow in spite of its small size. The metal diaphragm valve of the present invention comprises a body 2 provid ed with an inflow path 6, a valve chamber 8 and an outflow path 7 and a metal diaphragm 3, driving means 4 and a ring-shaped groove 5, wherein the diameter D of the inflow path 6 is larger than the width W of the ring-shaped groove 5 and the effective cross- sectional area of the regions where the ring-shaped groove 5 and the outflow path 7 interse ct one another is larger than the transverse cross-sectional area of the outflow path 7.</S DOAB>
申请公布号 CA2407989(A1) 申请公布日期 2003.10.24
申请号 CA20022407989 申请日期 2002.04.24
申请人 FUJIKIN INCORPORATED 发明人 ITOI, SHIGERU
分类号 F16K7/16;F16K1/42;F16K7/14;F16K31/122 主分类号 F16K7/16
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