| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection-type optical system, an exposure apparatus having the same projection-type optical system and an exposing method, to obtain a predetermined resolution and obtain superior exposing performance. SOLUTION: A projection-type optical system is provided having an optical element which includes a reflection area and/or a refraction region which is substantially symmetric with respect to an optical axis, uses the relevant region as the local regions, and is rotatable about the optical axis. COPYRIGHT: (C)2004,JPO
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