发明名称 AUTOMATIC FOCUSING SYSTEM IN SCANNING TYPE CHARGED PARTICLE MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide an automatic focusing system having a quick control function capable of determining a focusing position from the image information of a sheet of frame, and capable of surely focusing with high accuracy even to a horizontal pattern image. SOLUTION: This automatic focusing system comprises a means for changing the focusing position by every raster scanning line, and a control means for determining the focusing position by comparing the image information of every scanning line, the scanning line is an oblique scanning line having both of a horizontal component and a vertical component to the chip array on a semiconductor wafer. A method composed of a first step for roughly but surely getting the focusing position, and a second step for detecting the focusing position with high accuracy, is applied. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003303564(A) 申请公布日期 2003.10.24
申请号 JP20020108312 申请日期 2002.04.10
申请人 SEIKO INSTRUMENTS INC 发明人 SUZUKI HIDEKAZU;UEMOTO ATSUSHI
分类号 G02B7/28;G01N23/225;G02B7/36;G21K7/00;H01J37/21;H01J37/28;(IPC1-7):H01J37/21 主分类号 G02B7/28
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