MANUFACTURING METHOD FOR ARRAY STRUCTURE, CHARGED PARTICLE BEAM EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a high reliability blanking aperture array. SOLUTION: An insulating layer and a conductive layer are successively formed on the rear of a substrate 301, a plurality of pairs of facing grooves are formed on the substrate 301, and the insulating layer 305 is formed on the side of the groove through thermal oxidation. Then, the bottom of the groove is etched for exposing the conductive layer, and a conductive material is selectively grown in the groove with the conductive layer as an electrode for plating for forming a blanking electrode 308. After that, an opening 314 is formed between the facing blanking electrodes 308. COPYRIGHT: (C)2004,JPO