| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treating method and a substrate treating device allowing efficient substrate treatment and monitoring. SOLUTION: Voltage is applied from a high voltage power supply 40 to a gap between a substrate 34 and a facing electrode 38 that are disposed facingly in vacuum atmosphere, thereby releasing micro particles on the substrate toward the facing electrode. A plurality of photodetectors 42 detect light emission caused by the micro particles released from the substrate, thereby conditioning and monitoring the substrate. COPYRIGHT: (C)2004,JPO
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