| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection lens system capable of making the degree of aberration or distortion smaller when the aspect ratio of a necessary visual field is large. SOLUTION: A reticle R and a wafer W are arranged perpendicularly to the optical axis 1 of the projection lens system, and a projection lens system 2 is provided between the reticle R and the wafer W. The projection lens system 2 forms the image of a pattern formed on the reticle R on the wafer W. A field 3 is part of the circular arc of a circle around the optical axis 1 and has specified width. Therefore, the curvature of field in a range where the difference of a distance from the optical axis is equivalent to the width of the visual field is to be considered, and the lens is to be designed so that the curvature is corrected. COPYRIGHT: (C)2004,JPO |
