| 摘要 |
PROBLEM TO BE SOLVED: To improve positioning accuracy by reducing the transfer of a disturbance. SOLUTION: The apparatus for determining a moving position comprises a reticle stage 2 which is freely guided in the Y direction on a surface table, a wafer stage 3 which is freely supported on the reticle stage 2, a corner cube 10 for measuring displacement in the moving direction of the reticle stage 2, an X-reflecting mirror 15 or the like to measure displacement in the moving direction of the wafer stage 3, a first drive system to generate a driving force to move the wafer stage 3 in the moving direction, and a second drive system to generate a driving force to move the reticle stage 2 in the moving direction. Y-linear motors YLM 1, 2 for the moving direction of the reticle stage 2 of the first drive system are provided between the reticle stage 2 and the wafer stage 3. COPYRIGHT: (C)2004,JPO |
