| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma deposition apparatus which enables accurate end-point detection for cleaning without accompanying the emission of light, and to provide a cleaning method. SOLUTION: The plasma deposition apparatus 1 is provided with a first vacuum gauge (diaphragm vacuum gauge) 15 whose sensitivity is unchangeable irrespective of the kind of gas, and a second vacuum gauge (Pirani gauge) 16 whose sensitivity changes according to the kind of gas. A gas composition change in a treatment chamber 10 accompanied by cleaning is detected by the second vacuum gauge 16 under an atmosphere in which a value measured by the first vacuum gauge 15 is fixed. The end point of cleaning is specified based on the gas compositional change. COPYRIGHT: (C)2004,JPO
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