| 摘要 |
PROBLEM TO BE SOLVED: To provide a ceramic heater excellent in temperature control and temperature evenness on a heating surface capable of being suitably utilized for uses such as drying and sputtering of a silicon wafer or the like mainly in a semiconductor industry. SOLUTION: A heating element is formed on the surface of or inside a ceramic plate, which is equipped with a bottomed hole toward a heated face from an opposite side of the heated face of a heated object, and at the same time, a thermometric element is fitted to the bottomed hole, in which a heat- resistant resin or ceramic is filled to form the ceramic heater. COPYRIGHT: (C)2004,JPO
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