发明名称 METHOD FOR FABRICATING FIELD EFFECT TRANSISTOR USING SUPERCONDUCTOR
摘要 PURPOSE: A method for fabricating a field effect transistor(FET) using a superconductor is provided to improve repeatability by using MgB2 as a superconducting layer, and to reduce fabricating cost by using a cooling apparatus for a high temperature superconductor. CONSTITUTION: A gate metal is formed on a substrate(10). A gate insulation layer is formed on the gate metal. A source/drain electrode(40) is formed on the gate insulation layer. A gate electrode(50) is so formed to contact the gate metal. A superconducting layer in contact with the source/drain electrode is formed.
申请公布号 KR20030082740(A) 申请公布日期 2003.10.23
申请号 KR20020021206 申请日期 2002.04.18
申请人 LG ELECTRONICS INC. 发明人 CHOI, HONG SEOK
分类号 H01L39/22;(IPC1-7):H01L39/22 主分类号 H01L39/22
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