发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
In a lithographic projection apparatus, ingress of contaminants to a component is prevented by providing a first flow of purge gas through the inside of a first compartment encapsulating the component and a second flow of purge gas to an external surface of the compartment.
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申请公布号 |
US2003197844(A1) |
申请公布日期 |
2003.10.23 |
申请号 |
US20030354153 |
申请日期 |
2003.01.30 |
申请人 |
MERTENS JEROEN JOHANNES SOPHIA MARIA |
发明人 |
MERTENS JEROEN JOHANNES SOPHIA MARIA |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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