发明名称 |
Antireflective SiO-containing compositions for hardmask layer |
摘要 |
Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantageously useful with shorter wavelength lithographic processes and/or have minimal residual acid content.
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申请公布号 |
US2003198877(A1) |
申请公布日期 |
2003.10.23 |
申请号 |
US20020124087 |
申请日期 |
2002.04.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
PFEIFFER DIRK;ANGELOPOULOS MARIE;BABICH KATHERINA;BROCK PHILLIP;HUANG WU-SONG;MAHOROWALA ARPAN P.;MEDEIROS DAVID R.;SOORIYAKUMARAN RATNAM |
分类号 |
G03F7/11;G03F7/004;G03F7/038;G03F7/075;G03F7/09;H01L21/027;(IPC1-7):G03F7/004;G03F7/20;G03F7/095 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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