METHOD FOR PRODUCING A MASK ADAPTED TO A LIGHTING DEVICE

摘要

Information about the respective positions (501, 502, 601, 602) of at least two structural elements (50, 60) on a mask is provided. The displacement of the positions caused by lens aberration during reproduction of the lens system of the lighting device is measured, and correction values (540, 640) are determined for each of the structural elements. By using the correct values (540, 640), the positions (501, 502, 601, 602) are altered in order to form new positions (505, 506, 605, 606) of the structure elements (50, 60) so that the aberration effects can be compensated. A mask (40) which is adapted to the lighting device is illuminated with the structures placed in the altered positions. The scattering caused by the aberration of the lenses in the precise positions and the structural width distributions is advantageously reduced.