INTERFEROMETRIC MEASURING DEVICE AND PROJECTION ILLUMINATION INSTALLATION COMPRISING ONE SUCH MEASURING DEVICE

摘要

The invention relates to a device for the interferometric measurement of an optical imaging system which is used to image a useful model provided on a mask in the image plane of said imaging system. Said measuring device has a wave front source for producing at least one wave front which passes through the imaging system, a diffraction grid which can be arranged behind the imaging system in order to interact with the wave front which is modified by the imaging system, and a spatially resolving detector which is associated with the diffraction grid and is used to detect interferometric information. The wave front source comprises at least one measuring model (34) which is embodied on the mask (8) along with the useful model (35).