METHOD FOR PRODUCING MATERIAL OF ELECTRONIC DEVICE

摘要

A method for forming a film on the surface of the basic material of an electronic device by using plasma based on microwave irradiation through a planar antenna member having a plurality of slits under existence of a processing gas comprising at least a gas containing a film forming substance and a rare gas. An insulation film capable of forming the basic material of an electronic device having an insulation film of good electric characteristics can thereby be formed.