RESIST FILM REMOVING APPARATUS, METHOD OF REMOVING RESIST FILM, ORGANIC MATTER REMOVING APPARATUS AND METHOD OF REMOVING ORGANIC MATTER

摘要

A sheet feeding type resist removing apparatus, having substrate (111) being a cleaning object disposed therein and comprising treatment chamber (101) defining a closed space and spray nozzle (102) capable of spraying a cleaning liquid in the form of commonly-so-termed liquid drops over a surface of substrate (111), wherein the closed space enclosing the substrate (111) in such an arrangement that the disposed substrate (111) is opposite to the spray nozzle (102) is formed by the treatment chamber (101). This construction enables forming a cleaning liquid into liquid drops in consideration of energy reduction and further desirably regulating the temperature of liquid drops at contact with the resist film in the operation of spraying a cleaning liquid over the resist film on the surface of substrate (111) to thereby remove the resist film, so that secure removal of the resist film can be accomplished.