发明名称 |
Semiconductor device analysis system |
摘要 |
A semiconductor device analysis system is provided. In a data analysis mechanism (2a) included in a data analyzing EWS, a failure generator (11) artificially generates failure shape data about the shape of a failure assumed to occur in an actual semiconductor device. An analysis database (9) stores therein failure shape recognized data provided from a failure shape recognizer (8) and the failure shape data provided from the failure generator (11). A data processor (10) performs a failure analysis process based on the failure shape recognized data and the failure shape data.
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申请公布号 |
US2003200056(A1) |
申请公布日期 |
2003.10.23 |
申请号 |
US20020265722 |
申请日期 |
2002.10.08 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TSUTSUI TOSHIKAZU |
分类号 |
G01R31/28;G01R31/319;G01R31/3193;H01L21/66;(IPC1-7):G06F15/00 |
主分类号 |
G01R31/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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