发明名称 HIGH-RESOLUTION X-RAY DIFFRACTION APPARATUS
摘要 <p>A high resolution X-ray diffraction apparatus includes a source 4 of X-rays and a slit 6 to direct a collimated beam of X-rays 11 onto a sample 16 at an angle of between 0° and 60° to the sample's normal direction. Detector 10 records the intensity of X-rays diffracted by the sample at an angle of between 80° and 90° to the sample's normal direction as a function of position along its length. The geometry allows high resolution without the use of a monochromator.</p>
申请公布号 WO2003087795(P1) 申请公布日期 2003.10.23
申请号 NL2003000272 申请日期 2003.04.10
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