发明名称 |
Secondary lighting system has auxiliary reflector curved and/or bent so edge regions are at least partly returned relative to central region for radiation characteristic with increased aperture angle |
摘要 |
The system has a light source (20), a main reflector (40), a secondary reflector (60) and an auxiliary reflector (80) that is curved and/or bent so that its edge regions are at least partly returned relative to its central region in relation to the secondary reflector or its main radiation direction, so that a radiation characteristic with an increased aperture angle is produced.. AN Independent claim is also included for the following: a light with an inventive system.
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申请公布号 |
DE10213536(A1) |
申请公布日期 |
2003.10.23 |
申请号 |
DE20021013536 |
申请日期 |
2002.03.26 |
申请人 |
SITECO BELEUCHTUNGSTECHNIK GMBH |
发明人 |
TEKLAK, JANUSZ |
分类号 |
F21V7/00;(IPC1-7):F21V7/09;F21V7/06 |
主分类号 |
F21V7/00 |
代理机构 |
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代理人 |
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主权项 |
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