发明名称 Secondary lighting system has auxiliary reflector curved and/or bent so edge regions are at least partly returned relative to central region for radiation characteristic with increased aperture angle
摘要 The system has a light source (20), a main reflector (40), a secondary reflector (60) and an auxiliary reflector (80) that is curved and/or bent so that its edge regions are at least partly returned relative to its central region in relation to the secondary reflector or its main radiation direction, so that a radiation characteristic with an increased aperture angle is produced.. AN Independent claim is also included for the following: a light with an inventive system.
申请公布号 DE10213536(A1) 申请公布日期 2003.10.23
申请号 DE20021013536 申请日期 2002.03.26
申请人 SITECO BELEUCHTUNGSTECHNIK GMBH 发明人 TEKLAK, JANUSZ
分类号 F21V7/00;(IPC1-7):F21V7/09;F21V7/06 主分类号 F21V7/00
代理机构 代理人
主权项
地址