| 摘要 |
<p>A method is described that involves retrieving a generic layout description of a circuit structure from a first database that stores a plurality of generic layout descriptions. The method also involves retrieving a foundry design rule profile of a semiconductor manufacturing process from a second database that stores a plurality of semiconductor manufacturing process design rule profiles. The method also involves automatically generating a layout of the circuit structure that conforms to the foundry design rule profile.</p> |
