发明名称 TRÄGERVORRICHTUNG FÜR EINE CHEMISCH-MECHANISCHE POLIERVORRICHTUNG, MIT EINEM HALTERRING UND EINER TRÄGERPLATTE MIT MEHRZONALER DRUCKSTEUERVORRICHTUNG
摘要 <p>The invention relates to a substrate carrier for holding a substrate (113) during a processing operation, said substrate carrier comprising: a disk-shaped block (160) of substantially non-porous material having a first surface for mounting said substrate, a second surface, and a third substantially cylindrical surface connecting said first and second surfaces; said first surface being substantially planar except for at least one cavity (250) extending from said substantially planar surface into an interior portion of said substrate carrier; a fluid communication (191',184') channel extending from said cavity to either said second surface or to said third surface to communicate a fluid from a source of fluid to said cavity; said first surface adapted to receive a flexible membrane (161) to cover said cavity and form a chamber (262) capable of holding a pressure when said fluid is communicated from said source of fluid to said cavity; and said membrane (161) expanding when said fluid is communicated under a pressure to said chamber (262) and exerting a force on a substrate (113) mounted to said membrane (161).</p>
申请公布号 DE60005270(D1) 申请公布日期 2003.10.23
申请号 DE2000605270 申请日期 2000.02.24
申请人 MITSUBISHI MATERIALS CORP., TOKIO/TOKYO 发明人 WANG, HUEY-MING;MOLONEY, S.;CHIN, SCOTT;GERAGHTY, J.;DYSON, JR.;DICKEY, K.
分类号 B24B37/30;B24B37/32;B24B41/06;B24B49/16;H01L21/304;(IPC1-7):B24B37/00 主分类号 B24B37/30
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