Correcting mask structures involves dividing structure into sub-structures, determining correction parameter per sub-structure, applying associated correction parameter to each sub-structure

摘要

The method involves analyzing the mask structure to determine the characteristics to be corrected, dividing the mask structure into sub-structures, determining a correction parameter for each sub-structure depending on the determined characteristics to be corrected and correcting the mask structures by applying the associated correction parameter to each sub-structure. Independent claims are also included for the following: (1) a data processing system for processing data representing a mask structure to be produced and; (2) a computer program for implementing the inventive method.