| 摘要 |
A probe having a probe tip, especially for use in an atomic force microscope, formed by micromachining techniques in a silicon wafer. The tip is photolithographically defined in a layer, preferably of silicon nitride deposited on the silicon wafer, and has a width and thickness of usually less than 250 nm. Thereby, the probe tip can be formed to have a generally square cross section in which one lateral dimension is determined by the layer thickness, and the other lateral dimension by the photolithography or by a subsequent step of focused ion beam milling. The portion of the silicon wafer underlying the area probe tip is etched away, preferably before the probe tip is etched, but another portion of the silicon is left to serve as a support at the base of the probe tip. A hinge may be formed in the silicon wafer, and the probe tip together with a robust shank can be made to rotate to a direction perpendicular to the wafer surface.
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