发明名称 SEMICONDUCTOR DEVICE HAVING SEMICONDUCTOR THIN-FILMS OF DIFFERENT CRYSTALLINITIES, SUBSTRATE THEREOF, PROCESS FOR PRODUCING THESE, LIQUID CRYSTAL DISPLAY UNIT AND PROCESS FOR PRODUCING THE SAME
摘要 A process for producing a substrate of thin-film semiconductor device, comprising a step of forming a non-single-crystal semiconductor thin-film on a base layer and an annealing step of irradiating the non-single-crystal semiconductor thin-film with energy rays so that the crystallinity of the non-single-crystal semiconductor constituting the non-single-crystal semiconductor thin-film is increased. In the annealing step, a multiplicity of unit regions each having at least one irradiation region irradiated with energy rays and at least one non-irradiation region not irradiated with energy rays are formed by simultaneously irradiating the non-single-crystal semiconductor thin-film with a plurality of energy rays.
申请公布号 WO03088331(A1) 申请公布日期 2003.10.23
申请号 WO2003JP04717 申请日期 2003.04.14
申请人 ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,;KIMURA, YOSHINOBU;MATSUMURA, MASAKIYO;YAMAMOTO, YOSHITAKA;NISHITANI, MIKIHIKO;HIRAMATSU, MASATO;JYUMONJI, MASAYUKI;NAKANO, FUMIKI 发明人 KIMURA, YOSHINOBU;MATSUMURA, MASAKIYO;YAMAMOTO, YOSHITAKA;NISHITANI, MIKIHIKO;HIRAMATSU, MASATO;JYUMONJI, MASAYUKI;NAKANO, FUMIKI
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 主分类号 H01L21/20
代理机构 代理人
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