发明名称 |
PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD |
摘要 |
An projection optical system having good optical features without being substantially affected by double refraction even when a crystal material showing an intrinsic double refraction such as fluorite is used. The projection optical system includes a crystal transmitting member formed of a crystal material to form an image on a first plane (R) onto a second plane (W). A light transmitting phase correcting member (PC) is provided for correcting the phase difference between mutually orthogonal polarization components produced due to a crystal transmitting member. The phase correcting member is formed of a uniaxial crystal with its optical axis almost agreeing with the optical axis (AX1) of an optical system.
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申请公布号 |
WO03088330(A1) |
申请公布日期 |
2003.10.23 |
申请号 |
WO2003JP04142 |
申请日期 |
2003.03.31 |
申请人 |
NIKON CORPORATION;OMURA, YASUHIRO;OZAWA, TOSHIHIKO |
发明人 |
OMURA, YASUHIRO;OZAWA, TOSHIHIKO |
分类号 |
G02B13/24;G02B1/02;G02B1/08;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G02B27/28 |
主分类号 |
G02B13/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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