发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD
摘要 An projection optical system having good optical features without being substantially affected by double refraction even when a crystal material showing an intrinsic double refraction such as fluorite is used. The projection optical system includes a crystal transmitting member formed of a crystal material to form an image on a first plane (R) onto a second plane (W). A light transmitting phase correcting member (PC) is provided for correcting the phase difference between mutually orthogonal polarization components produced due to a crystal transmitting member. The phase correcting member is formed of a uniaxial crystal with its optical axis almost agreeing with the optical axis (AX1) of an optical system.
申请公布号 WO03088330(A1) 申请公布日期 2003.10.23
申请号 WO2003JP04142 申请日期 2003.03.31
申请人 NIKON CORPORATION;OMURA, YASUHIRO;OZAWA, TOSHIHIKO 发明人 OMURA, YASUHIRO;OZAWA, TOSHIHIKO
分类号 G02B13/24;G02B1/02;G02B1/08;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G02B27/28 主分类号 G02B13/24
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