发明名称 High resolution electron beam exposure machines
摘要 Space charges of electrons which repel one another near masks in electron beam exposure machines are reduced by bleeding gas into the vicinity of the apertures in the mask and pumping the gas out from the direction electron travel.
申请公布号 US6635888(B1) 申请公布日期 2003.10.21
申请号 US19980247177 申请日期 1998.01.02
申请人 LEPSELTER MARTIN P. 发明人 LEPSELTER MARTIN P.
分类号 H01J37/02;(IPC1-7):H01J37/30 主分类号 H01J37/02
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