发明名称 |
Metal-insulator-metal capacitor |
摘要 |
An interconnection wiring system incorporating two levels of interconnection wiring separated by a first dielectric, a capacitor formed by a second dielectric, a bottom electrode of the lower interconnection wiring or a via and a top electrode of the upper interconnection wiring or a separate metal layer. The invention overcomes the problem of leakage current and of substrate stray capacitance by positioning the capacitor between two levels of interconnection wiring.
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申请公布号 |
US6635527(B1) |
申请公布日期 |
2003.10.21 |
申请号 |
US19990318867 |
申请日期 |
1999.05.26 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GRECO NANCY ANNE;HARAME DAVID LOUIS;HUECKEL GARY ROBERT;KOCIS JOSEPH THOMAS;NGOC DOMINIQUE NGUYEN;STEIN KENNETH JAY |
分类号 |
H01L27/04;H01L21/02;H01L21/768;H01L21/822;H01L23/522;(IPC1-7):H01L21/824 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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