发明名称 |
Liquid treatment system and liquid treatment method |
摘要 |
Liquid treatment units are disposed in multi-tiers surrounding a main-arm 35. Among liquid treatment units, plating units M1 through M4 are disposed on a lower tier side, and a unit for post-treatment process such as a cleaning unit 70 where a cleaner atmosphere is necessary is disposed on an upper tier side. Thereby, an improvement in an area efficiency and the formation and maintenance of a clean atmosphere can be simultaneously obtained.
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申请公布号 |
US6634370(B2) |
申请公布日期 |
2003.10.21 |
申请号 |
US20010849276 |
申请日期 |
2001.05.07 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
NAKASHIMA SATOSHI;OKASE WATARU;MATSUO TAKENOBU;HYAKUZUKA TAMEYASU;YAGI YASUSHI;HARIMA YOSHIYUKI;YAMAUCHI JUN;TANIYAMA HIROKI;PARK KYUNGHO;TANAKA YOSHITSUGU;KATO YOSHINORI;SATO HIROSHI |
分类号 |
C25D7/12;H01L21/00;H01L21/687;(IPC1-7):B08B3/00;B05C13/00 |
主分类号 |
C25D7/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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