发明名称 Liquid treatment system and liquid treatment method
摘要 Liquid treatment units are disposed in multi-tiers surrounding a main-arm 35. Among liquid treatment units, plating units M1 through M4 are disposed on a lower tier side, and a unit for post-treatment process such as a cleaning unit 70 where a cleaner atmosphere is necessary is disposed on an upper tier side. Thereby, an improvement in an area efficiency and the formation and maintenance of a clean atmosphere can be simultaneously obtained.
申请公布号 US6634370(B2) 申请公布日期 2003.10.21
申请号 US20010849276 申请日期 2001.05.07
申请人 TOKYO ELECTRON LIMITED 发明人 NAKASHIMA SATOSHI;OKASE WATARU;MATSUO TAKENOBU;HYAKUZUKA TAMEYASU;YAGI YASUSHI;HARIMA YOSHIYUKI;YAMAUCHI JUN;TANIYAMA HIROKI;PARK KYUNGHO;TANAKA YOSHITSUGU;KATO YOSHINORI;SATO HIROSHI
分类号 C25D7/12;H01L21/00;H01L21/687;(IPC1-7):B08B3/00;B05C13/00 主分类号 C25D7/12
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