发明名称 Process for coating a siliceous substrate with a silicon containing layer
摘要 A process for coating at least a portion of a face of a siliceous substrate with a silicon containing layer, the process includes at least the following steps:a treatment step, in which at least the portion of the face of the siliceous substrate is treated with a composition containing at least one biocide, andat least the portion of the face of the siliceous substrate is reacted with a reactive composition for forming a silicon containing layer chemically bound to the siliceous substrate.
申请公布号 US6635305(B2) 申请公布日期 2003.10.21
申请号 US20010843618 申请日期 2001.04.26
申请人 ICT COATING N.V. 发明人 SIREJACOB GINO
分类号 C03C17/00;C03C17/30;C03C17/34;(IPC1-7):B05D1/00;B05D3/10;A61L27/00 主分类号 C03C17/00
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