| 摘要 |
PURPOSE:To enhance the work efficiency of electrode formation through a decreased number of the work processes, by forming a photoresist film over the exposed edges of a lower layer during the formation of an upper electrode conductor layer, and thereby making the edges of a first electrode layer to be protected during the patterning of a second electrode conductor layer. CONSTITUTION:An X-electrode group pattern 2 corresponding to the first electrode layer, is formed on the surface of a glass base plate 1 common to X and Y electrodes. A first dielectric layer 3 serving as an insulating layer is formed on the X-electrode group 2, which works as a display area. The entire surface of the base plate 1 including the surface of a conductive film 4 is coated with a photoresist film of a positive pattern, before only resist films 5a are left so as to form a resist pattern. After that, parts 4a of the conductive film 4 that are not covered with any resist film are removed, thereby the conductive film 4 being formed into a pattern corresponding to a Y-electrode group serving as the second electrode conductor layer. Here, the edges of the X- electrode group 2 are not corroded since they are coated and protected with the resist films 5a. Following that, the resist films 5a are removed, thereby the X and Y electrode groups being formed over the base plate 1, with the dielectric 3 interposed between the X and Y electrode groups. |
