METHOD AND APPARATUS FOR PLOTTING ELECTRON BEAM AND SEMICONDUCTOR-MANUFACTURING METHOD USING THEM

摘要

PROBLEM TO BE SOLVED: To provide an accurate and high-speed electron beam-plotting technique for carrying out the position correction of each beam without using reflector arrays or enormous and precise drive circuits in a multi-beam plotting system. SOLUTION: In the electron beam-plotting technique for independently turning on and off each of a plurality of electron beams for scanning to plot a desired pattern on a sample, the deviation between a pattern that is plotted by each of the plurality of electron beams and the desired pattern to be plotted is controlled by shifting the position of pattern data that are drawn by each of the plurality of electron beams. COPYRIGHT: (C)2004,JPO