| 摘要 |
PURPOSE: A shadow mask is provided to prevent deformation of shadow mask caused due to impacts applied from an external source, while reducing manufacturing procedures and costs. CONSTITUTION: A shadow mask comprises an aperture portion(13b) where a plurality of electron beam passing holes are formed; a non-aperture portion spaced apart from four edges of the aperture portion; and a skirt portion bent from the edge of the non-aperture portion. The condition 100%<RMV'/RMV<110% and the condition 120%<RMS/RMV'<150% are satisfied, wherein RMV is the vertical radius of curvature of the aperture portion with respect to the vertical axis direction passing through the center of the aperture portion, RMS is the vertical radius of curvature of the aperture portion with respect to the shorter side of the aperture portion, and RMV' is the vertical radius of curvature of the aperture portion with respect to an arbitrary position on the horizontal axis passing through the center of the aperture portion.
|
