| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaner and dryer, and a cleaning and drying method of a semiconductor wafer in which a cleaning and drying effect is enhanced, the waste of cleaning liquid is prevented by circulating and recycling used cleaning liquid, and environmental pollution is reduced. SOLUTION: Cleaning liquid composed of isopropylalcohol (IPA) and ultrapure water is premixed to have a desired concentration before being supplied to a treatment tank 11. Consequently, the removal of residual compounds by ultrapure water and the generation of a water spot by IPA are controlled efficiently. The cleaning and drying effect of a wafer is thereby enhanced and cleaning liquid can be recycled. COPYRIGHT: (C)2004,JPO
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