发明名称 PHOTO-IC WAFER INSPECTION DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a photo-IC wafer inspection device capable of inspecting a photo-IC wafer in a short time. <P>SOLUTION: The photo-IC wafer inspection device 10 is provided with a photodiode 17 for detecting light intensity inside an integrating sphere 11. The inspection device 10 is provided with a personal computer 14 for performing control to a DC source/monitor 12 so as to successively change the light intensity of a LED device 16. The inspection device 10 is provided with a probe card 21 for measuring the output level of a photo IC by the illumination of scattered light from an opening 15a when the light intensity of the LED device 16 is changed. On the basis of the photodiode output current of the photodiode 17 when the probe card 21 detects the change of the output level of the photo IC, the personal computer 14 calculates the threshold voltage of the photo IC. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003297884(A) 申请公布日期 2003.10.17
申请号 JP20020103253 申请日期 2002.04.05
申请人 TOKAI RIKA CO LTD 发明人 KOMAGATA NOBUYUKI
分类号 G01R31/26;H01L21/66;H01L33/00;(IPC1-7):H01L21/66 主分类号 G01R31/26
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