发明名称 ELECTRODE PLATE FOR PLASMA TREATMENT DEVICE AND PLASMA TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To solve problems that a structure is complicated and a gas hole whose effective diameter is small. SOLUTION: In an electrode plate for a plasma treatment device, an upper electrode 23 includes a cooling plate 34 and an electrode plate 36. The electrode plate 36 has a plurality of grooves 43 wherein sockets 44 made of resins or the like are accommodated. Screw holes 44A are formed in the sockets 44, and the cooling plate 34 and the electrode 36 are joined by screwing screws 42 into the screw holes 44A. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003297806(A) 申请公布日期 2003.10.17
申请号 JP20020098053 申请日期 2002.03.29
申请人 TOKYO ELECTRON LTD 发明人 MATSUSHIMA KEIICHI;SUZUKI TAKASHI;FURUYA HAJIME
分类号 H01L21/3065;C23F1/00;H01J37/32;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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