| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning and drying method and a cleaner and dryer of an electronic device in which the clean surface of a semiconductor substrate can be obtained by controlling the transfer of dust between the semiconductor substrates through an organic solvent layer at the time of pulling up the electronic device (especially, the semiconductor substrate) from a cleaning tank in a drying process following to cleaning. SOLUTION: The cleaning and drying method comprises a step (a) for supplying heated cleaning water into a treatment tank arranged with an electronic device to form a cleaning water layer where a water level has a height covering the electronic device sufficiently, a step (b) for supplying an inert gas to the upper section of the treatment tank such that a space above the water level in the treatment tank is occupied with an inert atmosphere, a step (c) for forming an organic solvent layer on the cleaning water layer by supplying a water soluble organic solvent above the cleaning water layer, and a step (d) for drying the electronic device in an inert gas layer by pulling it up into the inert gas layer wherein a partition plate is provided between the electronic devices at the time of pulling the electronic device up into the inert gas layer in the step (d). COPYRIGHT: (C)2004,JPO
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