发明名称 P-TYPE 3-5 COMPOUND SEMICONDUCTOR, MANUFACTURING METHOD THEREFOR AND COMPOUND SEMICONDUCTOR ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a p-type nitride compound semiconductor whose contact resistance against an electrode metal is low and which has a high carrier concentration. <P>SOLUTION: A 3-5 compound semiconductor in which a p-type dopant is doped and which is represented by a general formula In<SB>x</SB>Ga<SB>y</SB>Al<SB>z</SB>N (0&le;x&le;1, 0&le;y&le;1, 0&le;z&le;1 and x+y+z=1) is heat-treated in a mixed gas atmosphere comprising gas comprising oxygen and gas comprising hydrogen. Thus, the p-type nitride 3-5 compound semiconductor whose contact resistance against the electrode metal is low, which is superior in electric properties such an ohmic properties and which has a high carrier concentration can be manufactured. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003297842(A) 申请公布日期 2003.10.17
申请号 JP20030018817 申请日期 2003.01.28
申请人 SUMITOMO CHEM CO LTD 发明人 ONO YOSHINOBU;TSUCHIDA YOSHIHIKO
分类号 H01L21/324;H01L33/32;H01L33/40 主分类号 H01L21/324
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