| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a TFT array substrate where the deterioration of TFT characteristics due to light irradiation is suppressed, and to provide a manufacturing method of the substrate and a liquid crystal display which uses the method. <P>SOLUTION: The manufacturing method of the TFT array substrate has a process for forming a gate insulating film 3, a semiconductor layer 4a, an ohmic layer 4b and a metal film 16 on the substrate where gate wiring 1 is formed, a process for forming a resist pattern 17 on the metal film 16 by a photomechanical process so that a film thickness on an applied part of a semiconductor device layer 8 becomes thinner than that of the other part, a process for etching the metal film 16 and forming source wiring 6, a source electrode 5 and a drain electrode 7, a process for removing a resist on the applied part of the semiconductor active layer 8 and removing the ohmic layer 4b and the semiconductor layer 4a, a process for removing the metal film 16 and a process for removing the ohmic layer 4b. <P>COPYRIGHT: (C)2004,JPO</p> |
