发明名称 DRYING EQUIPMENT AND DRYING METHOD FOR INCREASING MARANGONI EFFECT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide drying equipment for a semiconductor substrate for increasing a Marangoni effect. <P>SOLUTION: The drying equipment comprises a chamber receiving a gas distributor 15 and a liquid storage tank 3a, and a liquid fluidity system for providing the fluidity of liquid in the liquid storage tank for cleaning a semiconductor substrate and discharging the liquid from the liquid storage tank. The gas distributor is disposed in the upper section of the chamber in order to jet gas for drying the semiconductor substrate, and the liquid storage tank is disposed in the lower section of the chamber. The chamber is provided, at the upper section thereof, with a plurality of exhaust holes 11a for discharging gas fed into the chamber. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003297796(A) 申请公布日期 2003.10.17
申请号 JP20020350394 申请日期 2002.12.02
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 YI HUN JUNG;KIN KEIDAI;CHON SANG-MOON;LEE KI-SEOK;LEE BO-YUNG;PARK SANG-O;JUN PIL-KWON
分类号 F26B9/06;F26B11/02;H01L21/00;H01L21/304;H01L21/683;(IPC1-7):H01L21/304;H01L21/68 主分类号 F26B9/06
代理机构 代理人
主权项
地址