| 摘要 |
PURPOSE:To obtain the fully high resolving-power even in the case of a too big sample by arranging the upper-and-lower magnetic pole pieces of an objective, so that the outer diameter of the upper magnetic pole piece, the hole diameter of the lower part magnetic pole piece and a gap between the upper-and-lower part magnetic pole pieces may be arranged specific relations. CONSTITUTION:This electron microscope is provided with the upper magnetic pole piece 20 having an electron ray passage 5 as a charged particle ray passage and an objective 10 having the lower magnetic pole piece 30. Further below the objective 10 and near said lens 10, a big sample 9' such as an LSI and an IC wafer is made to be arranged. In said objective lens 10, the upper-and-the lower magnetic pole pieces 20 and 30 are arranged in such relations that, when it is presumed that the outer diameter of the upper magnetic pole piece 20 is A, the hole diameter of the lower magnetic pole piece 30 is B, the gap between the lower surface of the upper magnetic pole piece and the upper surface of the lower magnetic pole piece 30 is S(>=0), A<B<80mm.phi, S<(B-A)/4 can be satisfied. Thereby, even in case the sample is too big so that it must be placed downward apart from the lens, the sufficiently high resolving-power can be obtained. |
